日立 HITACHI S-2400 扫描电子显微镜用途：适用于材料科学、生物学、半导体等多领域。可对各类样品，如金属、陶瓷、生物切片等进行微观表面结构观察，获取表面形貌、颗粒大小及分布等信息，结合能谱仪可开展微区化学成分分析。技术原理：电子枪发射电子束，在加速电压作用下，经电子透镜聚焦后扫描样品表面。样品受电子束激发产生二次电子、背散射电子等信号，仪器收集并放大这些信号，转化为图像呈现样品微观特征。性能：加速电压范围 0.5 - 30kV；二次电子像分辨率在高分辨率模式下可达 2.5nm；放大倍率最高 200,000X；配备热电子发射电子枪；采用锥形物镜，在大型样品倾斜观察或 EDX 分析时，可缩短工作距离至 12mm，降低像差，提高分辨率；采用静止图像显示方式，能在明室中观察 SEM 图像；具备自动调节亮度、对比度、聚焦等功能 。Product Name: Hitachi HITACHI S-2400 Scanning Electron MicroscopePurpose: It is applicable to multiple fields such as materials science, biology, and semiconductors. It can observe the micro surface structures of various samples like metals, ceramics, and biological sections, obtaining information such as surface morphology, particle size and distribution. In combination with an energy spectrometer, it can conduct micro - area chemical composition analysis.Technical Principle: The electron gun emits an electron beam. Under the action of the acceleration voltage, it is focused by the electron lens and then scans the sample surface. The sample is excited by the electron beam to generate signals such as secondary electrons and backscattered electrons. The instrument collects and amplifies these signals and converts them into images to present the micro characteristics of the sample.Performance: The acceleration voltage ranges from 0.5 - 30 kV. The resolution of the secondary electron image can reach 2.5 nm in the high - resolution mode. The maximum magnification is 200,000X. It is equipped with a thermionic emission electron gun. The conical objective lens is adopted. When observing large samples at an angle or performing EDX analysis, the working distance can be shortened to 12 mm, reducing aberration and improving resolution. The still - image display method is used, allowing the observation of SEM images in a bright room. It has functions such as automatic adjustment of brightness, contrast, and focus.