FEI / THERMO FISCHER Nova NanoLab 200 聚焦离子束扫描电子显微镜用途：适用于纳米技术领域的原型制作、加工、二维及三维表征与分析。可用于 TEM 样品制备、纳米管结构组装、纳米桥构建等，助力材料微观结构研究与纳米器件开发。技术原理：整合了 30 kV 场发射电子柱和 30 kV 镓离子柱。电子束用于成像，离子束用于蚀刻和沉积。通过电子与样品相互作用产生二次电子、背散射电子等信号成像；离子束则通过对样品表面原子的溅射实现蚀刻，利用气体注入系统实现材料沉积 。性能：二次电子图像在双束重合点的分辨率在 15 kV 时为 1.5 nm。聚焦离子束光学系统在 30 kV 时分辨率优于 7 nm 。具备多种成像模式，如二次电子成像、背散射电子成像等。样品台在 x-y 轴的移动范围为 50 mm x 50 mm 。Product Name: FEI / THERMO FISCHER Nova NanoLab 200 Focused Ion Beam Scanning Electron MicroscopePurpose: It is applicable to prototyping, machining, 2D and 3D characterization and analysis in the field of nanotechnology. It can be used for TEM sample preparation, nanotube - based structure assembly, nano - bridge construction, etc., facilitating the research on material microstructure and the development of nanodevices.Technical Principle: It integrates a 30 kV field - emission electron column and a 30 kV gallium ion column. The electron beam is used for imaging, and the ion beam is used for etching and deposition. Signals such as secondary electrons and backscattered electrons generated by the interaction of electrons with the sample are used for imaging. The ion beam realizes etching by sputtering surface atoms of the sample and material deposition by using a gas injection system.Performance: The resolution of the secondary electron image at the dual - beam coincidence point is 1.5 nm at 15 kV. The resolution of the focused ion beam optical system is better than 7 nm at 30 kV. It has a variety of imaging modes, such as secondary electron imaging and backscattered electron imaging. The movement range of the sample stage in the x - y axis is 50 mm x 50 mm.