日立 HITACHI S-4700 II用途：适用于材料科学、生命科学、半导体等领域。可对金属、高分子、半导体及复合材料等进行微米和纳米级微观表面形貌观察，也能分析样品微区成分。技术原理：冷阴极场发射电子枪发射电子束，电子束经加速电压加速后，由磁透镜聚焦到样品表面，并在偏转线圈作用下进行光栅扫描。电子与样品相互作用产生二次电子、背散射电子等信号，探测器收集这些信号并转化为电信号，经放大处理后成像。性能：分辨率方面，15kV、12mm 工作距离时可达 1.5nm，1kV、2.5mm 工作距离时为 2.5nm；放大倍率在高倍模式下为 100 - 500,000 倍，低倍模式为 20 - 2000 倍；加速电压范围是 0.5 - 30kV，能以 0.1kV 为增量调节；提取电压为 0 - 6.5kV；样品台为 Type II 型，Z 向移动 2.5 - 30mm（连续），倾斜 5 - 60°，旋转 360°，X 向移动 0 - 100mm，Y 向移动 0 - 50mm（连续），可承载样品最大直径 150mm 。Product Name: Hitachi HITACHI S-4700 IIPurpose: It is suitable for fields such as materials science, life sciences and semiconductors. It can observe the micro and nano - scale surface morphology of metals, polymers, semiconductors and composite materials, and also analyze the micro - area composition of samples.Technical Principle: The cold cathode field emission electron gun emits an electron beam. After being accelerated by the acceleration voltage, the electron beam is focused on the sample surface by the magnetic lens and undergoes raster scanning under the action of the deflection coil. The electrons interact with the sample to generate signals such as secondary electrons and backscattered electrons. The detector collects these signals and converts them into electrical signals, which are then amplified and processed for imaging.Performance: In terms of resolution, it can reach 1.5nm at 15kV and 12mm working distance, and 2.5nm at 1kV and 2.5mm working distance. The magnification is 100 - 500,000 times in high - magnification mode and 20 - 2000 times in low - magnification mode. The acceleration voltage ranges from 0.5 - 30kV and can be adjusted in increments of 0.1kV. The extraction voltage is 0 - 6.5kV. The sample stage is of Type II, with Z - movement of 2.5 - 30mm (continuous), tilt of 5 - 60°, rotation of 360°, X - movement of 0 - 100mm, Y - movement of 0 - 50mm (continuous), and can accommodate a sample with a maximum diameter of 150mm.