日立 HITACHI S-6280H 扫描电子显微镜用途：常用于半导体制造等领域的线宽测量，可在无需对晶圆进行切片、镀金等预处理的情况下，对光阻、绝缘层及金属层图案进行观察与量测，属于非破坏性检测设备，测量后的晶圆能继续后续制程。技术原理：利用冷阴极场发射电子源（CCFE）发射电子束，电子束经电磁透镜聚焦、加速后轰击样品表面，电子与样品相互作用产生二次电子等信号，探测器收集并转化为图像，以此呈现样品微观特征。性能：加速电压 0.7 - 1.3kV；发射电流 3 - 20mA；分辨率可达 6nm（针对金样品）；放大倍率为 100X - 150000X；可处理 6" 平边晶圆样品；影像旋转范围为 - 50° - 95°；电子源真空度≤1×10⁻⁷Pa 。Product Name: Hitachi HITACHI S-6280H Scanning Electron MicroscopePurpose: Commonly used for line - width measurement in fields such as semiconductor manufacturing. It can observe and measure the patterns of photoresist, insulating layers, and metal layers without pre - treatment steps like slicing or gold - plating of wafers. It is a non - destructive testing device, and the measured wafers can continue the subsequent manufacturing process.Technical Principle: Utilizes a cold cathode field emission electron source (CCFE) to emit an electron beam. The electron beam is focused and accelerated by electromagnetic lenses and then bombards the sample surface. Electrons interact with the sample to generate signals such as secondary electrons. Detectors collect and convert these signals into images to present the micro - characteristics of the sample.Performance: Acceleration voltage is 0.7 - 1.3kV; emission current is 3 - 20mA; resolution can reach 6nm (for gold samples); magnification is 100X - 150000X; can handle 6" flat - edge wafer samples; image rotation range is - 50° - 95°; vacuum degree of the electron source is ≤1×10⁻⁷Pa.