日立 HITACHI 5200（以 S-5200 超高分辨率场发射扫描电镜为例）用途：广泛用于半导体行业的工艺评估、颗粒分析、CD 测量；材料科学领域观察材料微观结构；纳米技术研究纳米材料；生命科学观察生物样品；地质学分析地质样品；工业领域用于产品质量控制等。技术原理：配备超高分辨率物镜，利用场发射电子源产生电子束，电子束扫描样品表面激发出二次电子、背散射电子等信号，通过不同信号检测模式获取样品信息成像。性能：分辨率达 1.8nm（1kV 时）或 0.5nm（30kV 时）；具备二次电子模式、低电压背散射电子模式（可选）、信号混合模式（可选）；污染率低，采用高速电子束消隐、干式真空系统及抗污染冷阱（可选）；机械稳定性高，允许 5Hz 时 10μm 的地面振动 。Product Name: Hitachi HITACHI 5200 (Taking S-5200 Ultra-High Resolution Field Emission Scanning Electron Microscope as an example)Purpose: It is widely used in process evaluation, particle analysis, and CD measurement in the semiconductor industry; observing the microstructure of materials in the field of materials science; studying nanomaterials in nanotechnology; observing biological samples in life sciences; analyzing geological samples in geology; and used for product quality control in the industrial field, etc.Technical Principle: Equipped with an ultra-high resolution objective lens, it uses a field emission electron source to generate an electron beam. The electron beam scans the sample surface to excite signals such as secondary electrons and backscattered electrons, and images are obtained by acquiring sample information through different signal detection modes.Performance: The resolution reaches 1.8nm (at 1kV) or 0.5nm (at 30kV); it has a secondary electron mode, a low-voltage backscattered electron mode (optional), and a signal mixing mode (optional); the contamination rate is low, using high-speed beam blanking, a dry vacuum system, and an anti-contamination cold trap (optional); it has high mechanical stability, allowing floor vibrations of 10μm at 5Hz.