日立 HITACHI RS - 5500 扫描电子显微镜用途：用于半导体材料微观检测。可清晰观察芯片表面细微结构，如光刻胶线条边缘、集成电路金属互连的空洞和裂缝等；也能对半导体芯片中掺杂元素定量分析，判定材料表面污染物元素构成，助力半导体产品研发、质量把控与失效分析。技术原理：通过先进电子光学系统发射电子束扫描样品，样品受激发产生二次电子等信号，高灵敏度探测器收集信号并转化为图像，用于分析微观形貌。性能：15kV 加速电压下二次电子图像分辨率达 1.0nm，1kV 时为 1.5nm ；搭载能谱仪（EDS）可分析硼（B）到铀（U）等元素，元素检测下限 0.1%；配备 15 英寸高清触控操作屏，有自动聚焦、扫描功能及多组参数预设；采用模块化设计，核心部件更换方便，内置智能诊断系统，可实时监测超 100 项运行参数并提前 48 小时预警潜在故障 。Product Name: Hitachi HITACHI RS - 5500 Scanning Electron MicroscopePurpose: It is used for the microscopic detection of semiconductor materials. It can clearly observe the fine structures on the chip surface, such as the edges of photoresist lines, voids and cracks in the metal interconnections of integrated circuits, etc. It can also quantitatively analyze the doping elements in semiconductor chips and determine the elemental composition of pollutants on the material surface, contributing to semiconductor product research and development, quality control and failure analysis.Technical Principle: An electron beam is emitted through an advanced electron optical system to scan the sample. The sample is excited to generate signals such as secondary electrons. A high - sensitivity detector collects the signals and converts them into images for micro - morphology analysis.Performance: The resolution of the secondary electron image reaches 1.0 nm at an acceleration voltage of 15 kV and 1.5 nm at 1 kV. The equipped energy - dispersive spectrometer (EDS) can analyze elements from boron (B) to uranium (U), with an element detection limit of 0.1%. It is equipped with a 15 - inch high - definition touch - screen operation panel, with functions such as automatic focusing, scanning and multiple parameter presets. It adopts a modular design, with convenient replacement of core components. The built - in intelligent diagnostic system can monitor over 100 operating parameters in real - time and provide a 48 - hour advance warning of potential failures.