日立 HITACHI HD-2000 扫描透射电子显微镜。用途：专为半导体应用中超薄片的评估与分析需求而设计，可用于观察半导体材料微观结构，助力半导体制造工艺优化及相关新材料研究。技术原理：运用透射电子显微镜（TEM）技术，通过电子枪发射电子束，电子束穿透样品后成像，从而获取样品微观结构信息。性能：分辨率高达 0.24nm ，最大放大倍数可达 200 万倍。样品通量比传统透射电镜快 20 - 30 倍，可搭载能量色散 X 射线光谱仪（EDS），还能与聚焦离子束系统（如 FB - 2000 ）配合使用，具备全面的研究分析能力。具备数字成像系统，可直接从图像显示测量关键参数，且支持联网，方便图像传输 。Product Name：Hitachi HITACHI HD - 2000 Scanning Transmission Electron Microscope.Purpose：It is specifically designed to meet the needs of evaluation and analysis of ultra - thin sections in semiconductor applications. It can be used to observe the microstructure of semiconductor materials, facilitating the optimization of semiconductor manufacturing processes and research on related new materials.Technical Principle：It uses Transmission Electron Microscopy (TEM) technology. An electron gun emits an electron beam, and after the electron beam penetrates the sample, it forms an image to obtain the microstructure information of the sample.Performance：It has a high resolution of 0.24nm and a maximum magnification of 2 million times. The sample throughput is 20 - 30 times faster than that of a traditional TEM. It can be equipped with an Energy Dispersive X - ray Spectrometer (EDS) and can also be used in combination with a focused ion beam system (such as FB - 2000), with comprehensive research and analysis capabilities. It has a digital imaging system that can directly measure key parameters from the image display and supports networking for convenient image transfer.