尼康 NIKON OPTISTATION - 3100用途：用于 300mm 晶圆检测，能在多种应用场景中，快速精准识别晶圆表面缺陷，助力研发阶段的缺陷分析，有效提升芯片生产良率。技术原理：采用尼康 CFI60 光学设计，通过高对比度成像技术，使光线经光学系统处理，清晰呈现晶圆表面细节。可根据需求选配深紫外（DUV）显微镜模块，满足先进制程检测需求。性能：搭载 CFI60 光学系统，生成高对比度、低眩光的清晰图像，暗场信号与背景比大幅提升；具备 3 模式宏观检测功能，新开发的宽（WIL - 100）和线（LIL - 100）照明器，可轻松检测多种工艺缺陷；检测倍率范围灵活，能满足不同精度检测要求；可选配 DUV 显微镜模块，支持先进设计规则 。

Product Name: NIKON OPTISTATION - 3100Purpose: It is used for 300mm wafer inspection. It can quickly and accurately identify defects on the wafer surface in various application scenarios, assist in defect analysis during the R & D stage, and effectively improve the yield of chip production.Technical Principle: It adopts Nikon's CFI60 optical design. Through high - contrast imaging technology, the light is processed by the optical system to clearly present the details of the wafer surface. The deep ultraviolet (DUV) microscope module can be selected as required to meet the needs of advanced process detection.Performance: Equipped with the CFI60 optical system, it generates clear images with high contrast and low glare, and the dark - field signal - to - background ratio is significantly improved. It has a 3 - mode macro inspection function. The newly developed wide (WIL - 100) and line (LIL - 100) illuminators can easily detect a variety of process defects. The detection magnification range is flexible to meet different accuracy detection requirements. The DUV microscope module can be optionally configured to support advanced design rules.