鲁道夫 RUDOLPH UlteaPort5用途：是一款用于半导体行业高分辨率图样应用的掩模和晶圆检测设备，可检测掩模片和晶片上蚀刻图样的缺陷。技术原理：3DI 体系结构利用先进光学器件，在光源和图像平面间实现高达 5° 的动态成像角度调整。专有光真空照明单元减少相机影像波动。性能：能精确检查顶角高达 80° 的图样，对光刻过程产生的缺陷，在 3μm 时检测率高达 5σm，可检测微小缺陷。具有直观 UI 接口，模块化设计可定制，有自动样品定位和定向功能，可选 “影片” 模式检查移动目标，提供电子束检测组件增加缺陷覆盖率，可同时映射和查看多达四个晶圆，7.5 英寸 LED 显示屏便于识别缺陷 。

Product Name: RUDOLPH UlteaPort5Purpose: It is a mask and wafer inspection equipment for high - resolution pattern applications in the semiconductor industry, which can detect defects in etched patterns on mask plates and wafers.Technical Principle: The 3DI architecture uses advanced optical devices to achieve a dynamic imaging angle adjustment of up to 5° between the light source and the image plane. The proprietary light - vacuum illumination unit reduces camera image fluctuations.Performance: It can accurately inspect patterns with top angles of up to 80°. For defects generated in the lithography process, the detection rate is as high as 5σm at 3μm, and it can detect tiny defects. It has an intuitive UI interface, a modular design for customization, automatic sample positioning and orientation functions. There is an optional "film" mode to inspect moving targets, an electron beam detection component is provided to increase the defect coverage rate. It can map and view up to four wafers simultaneously, and the 7.5 - inch LED display is convenient for defect identification.