尼康 NIKON OPTISTATION - 310用途：用于 300mm 晶圆的检测，能精准识别晶圆表面各类缺陷，助力半导体研发与生产环节的质量把控，提升芯片制造良率。技术原理：采用尼康 CFI60 光学设计，凭借高对比度成像技术，经光学系统处理光线，清晰呈现晶圆表面微观细节。通过对反射或透射光的分析，判定缺陷情况 。性能：可高效检测 300mm 晶圆；搭载的 CFI60 光学系统生成高对比度、低眩光图像，暗场信号与背景比出色；具备 3 模式宏观检测功能，新开发的宽（WIL - 100）和线（LIL - 100）照明器，能轻松检测多种工艺缺陷；检测倍率灵活，满足不同精度需求 。

Product Name: NIKON OPTISTATION - 310Purpose: It is used for the inspection of 300mm wafers. It can accurately identify various defects on the wafer surface, assist in quality control in the semiconductor R & D and production processes, and improve the yield of chip manufacturing.Technical Principle: It adopts Nikon's CFI60 optical design. With high - contrast imaging technology, the light is processed by the optical system to clearly present the micro - details of the wafer surface. The defect situation is determined by analyzing the reflected or transmitted light.Performance: It can efficiently detect 300mm wafers; The CFI60 optical system it is equipped with generates images with high contrast and low glare, and has an excellent dark - field signal - to - background ratio. It has a 3 - mode macro inspection function. The newly developed wide (WIL - 100) and line (LIL - 100) illuminators can easily detect a variety of process defects. The detection magnification is flexible to meet different accuracy requirements.