科磊 KLA-TENCOR ICOS HM-200用途：主要用于半导体晶圆及掩模版的高精度检测，能精准识别各类缺陷，助力半导体制造企业把控产品质量，提升芯片制造良率 。技术原理：采用先进的光学成像与分析技术，通过多角度光源照射，收集反射或散射光信号，利用算法对光信号进行处理与分析，从而清晰呈现晶圆及掩模版表面微观状况，实现缺陷的精准定位与类型判断 。性能：具备高分辨率成像能力，可检测出极小尺寸的缺陷，满足先进制程的严苛要求；检测速度快，能高效完成大面积晶圆及掩模版检测，提高生产效率；拥有强大的数据分析功能，可对检测数据进行统计分析，为工艺优化提供有力支持 。

Product Name: KLA-TENCOR ICOS HM-200Purpose: It is mainly used for high - precision inspection of semiconductor wafers and photomasks. It can accurately identify various defects, helping semiconductor manufacturing enterprises control product quality and improve the yield of chip manufacturing.Technical Principle: It adopts advanced optical imaging and analysis technology. By irradiating with multi - angle light sources, it collects reflected or scattered light signals, and uses algorithms to process and analyze the light signals, thus clearly presenting the micro - conditions on the surface of wafers and photomasks, and achieving accurate defect location and type judgment.Performance: It has high - resolution imaging capabilities and can detect defects of extremely small sizes, meeting the strict requirements of advanced manufacturing processes. It has a fast detection speed and can efficiently complete the inspection of large - area wafers and photomasks, improving production efficiency. It has a powerful data analysis function and can conduct statistical analysis on the inspection data, providing strong support for process optimization.