奥林巴斯 OLYMPUS MX50 显微镜用途：专为 6 及 8 寸晶圆及大面板 LCD/TFT 产业开发设计，适用于半导体制造、材料检测等领域，可对晶圆、面板等进行缺陷检测、微观结构观察，辅助质量控制与研发工作 。性能：采用 UIS2 无远限度光学系统，对光路中的耀斑有很好的抑制，可实现高图象对比度。提供高达 26.5mm 的超宽视野，便于全面观察样本。目镜放大倍数 10X，物镜放大倍数 5 - 100X，总放大倍数为 50X - 1000X 。镜体采用 2 个引导齿轮和齿条的结构。配备超宽视野正像可倾斜三目观察镜筒 U - SWETTR 。载物台为 MX - SIC1412。物镜转换盘是 U - D5BDRE（带微分干涉衬比法棱镜滑槽）。Z 轴同轴粗微调焦，载物台行程范围 32mm（从焦面上行 30mm，焦面下行 2mm ）。照明系统含 BX - RLA2 明暗视场照明器、BX - URA2 照明器，支持明暗视场滑块转换及分光镜组换镜旋座的观察方式转换 。

Product Name: Olympus OLYMPUS MX50 MicroscopePurpose: Specifically developed for the 6 - inch and 8 - inch wafer and large - panel LCD/TFT industries, it is suitable for semiconductor manufacturing, material inspection and other fields. It can be used for defect detection and microstructure observation of wafers, panels, etc., assisting in quality control and R & D work.Performance: It adopts the UIS2 infinity optical system, which can well suppress the flare in the optical path and achieve high image contrast. It provides an ultra - wide field of view of up to 26.5mm, facilitating comprehensive sample observation. The eyepiece magnification is 10X, the objective magnification is 5 - 100X, and the total magnification is 50X - 1000X. The microscope body adopts a structure of two guide gears and racks. It is equipped with an ultra - wide - field erect - image tilting trinocular observation tube U - SWETTR. The stage is MX - SIC1412. The objective turret is U - D5BDRE (with a prism chute for differential interference contrast method). The Z - axis has coaxial coarse and fine focusing, and the stage travel range is 32mm (30mm upward from the focal plane and 2mm downward from the focal plane). The illumination system includes BX - RLA2 bright/dark - field illuminator and BX - URA2 illuminator, supporting the observation method conversion of bright/dark - field slider conversion and spectroscope group lens - changing turret.