奥林巴斯 OLYMPUS GX51 倒置金相显微镜用途：适用于金属材料研究、机械制造、电子工业等领域，可用于观察金属材料金相组织、检测内部缺陷、分析微观结构，辅助产品质量把控与研发工作。性能：采用 UIS2 无限远校正光学系统，成像清晰、对比度高。照明系统有多种选择，反射照明可选用 100W 卤素灯、100W 汞灯或 75W 氙灯，透射照明为 100W 卤素灯。物镜转换器有电动和手动型，手动型包含多种组合，如明视场微分干涉 4 孔、明暗视场 5 孔等。内置 1 - 2x 变焦机构，方便调整倍率。配备超宽视野目镜（视场数 22），提供广阔视野。载物台行程为 50（X）×50（Y）mm 。可实现明视野、暗视野、微分干涉、简易偏光等多种观察方式，满足不同检测需求 。

Product Name: Olympus OLYMPUS GX51 Inverted Metallurgical MicroscopePurpose: Suitable for metal material research, machinery manufacturing, electronics industry and other fields. It can be used to observe the metallographic structure of metal materials, detect internal defects, analyze the microstructure, and assist in product quality control and R & D work.Performance: It adopts the UIS2 infinity - corrected optical system for clear imaging and high contrast. The illumination system has multiple options. The reflected illumination can use a 100W halogen lamp, 100W mercury lamp or 75W xenon lamp, and the transmitted illumination is a 100W halogen lamp. The objective turret has electric and manual types. The manual type includes various combinations, such as 4 - hole for bright - field differential interference and 5 - hole for bright/dark - field. With a built - in 1 - 2x zoom mechanism, it is convenient to adjust the magnification. Equipped with an ultra - wide - field eyepiece (field number 22), it provides a wide field of view. The stage travel is 50 (X)×50 (Y) mm. It can achieve a variety of observation methods such as brightfield, darkfield, differential interference, and simple polarized light, meeting different detection needs.