尼康 NIKON LV150N 正置工业显微镜用途：适用于半导体、电子元件、材料和精密模具制造等多领域。在半导体领域，可检测芯片表面缺陷、电路图案；在材料研究中，能分析金属、陶瓷等材料微观结构 。性能：采用模块化机身设计，灵活适配多样观察需求。支持明场、暗场、偏光、微分干涉、落射荧光和双光束干涉测量等观察方法。配备新研发的 CFI60 - 2 系列光学系统，实现高数值孔径与长工作距离，有效校正色差且机身轻巧 。通过智能物镜转换器 LV - NU5I 和物镜信号转接器 LV - INAD 组合，可检测在用物镜信息，并在相机控制单元监测器上显示，更换放大倍数时，信息自动转换为合适校准数据 。物镜到照明系统具备良好消杂光结构，提供高对比度明亮图像 。最大样品尺寸为 150×150mm 。

Product Name: Nikon NIKON LV150N Upright Industrial MicroscopePurpose: Suitable for multiple fields such as semiconductors, electronic components, materials, and precision mold manufacturing. In the semiconductor field, it can detect chip surface defects and circuit patterns; in materials research, it can analyze the microstructure of metals, ceramics, and other materials.Performance: It adopts a modular body design, flexibly adapting to diverse observation needs. It supports observation methods such as brightfield, darkfield, polarizing, differential interference contrast, epi - fluorescence, and two - beam interferometry. Equipped with the newly developed CFI60 - 2 series optical system, it achieves a high numerical aperture and a long working distance, effectively correcting chromatic aberration while maintaining a lightweight body. Through the combination of the intelligent nosepiece LV - NU5I and the nosepiece adapter LV - INAD, information about the objective lens in use can be detected and displayed on the monitor of the camera control unit. When changing the magnification, the information is automatically converted into appropriate calibration data. The objective lens to the illumination system has a good stray - light elimination structure, providing a bright image with high contrast. The maximum sample size is 150×150mm.