奥林巴斯 OLYMPUS MX51 工业检查显微镜。用途：适用于工业材料、电子元件的研究、开发、制造及质量管理领域。尤其适合小于 150mm 的半导体晶圆、磁头的检测，也可用于多种电子元件、晶圆及大型样本观察。性能：采用 UIS（无限远矫正）光学系统，提升物镜与照明器照明效率，暗场观察缺陷检测灵敏度约为上一代 MX40 的 4 倍。支持明场、暗场、相差、微分干涉（DIC）、简易偏振光、荧光等多种观察方式。标配 158×158mm 手动移动载物台（最大可用于 200mm 晶圆检查），选配长工作距离物镜便于磁头检查。机身与载物台防静电设计，防止样品被静电损坏。调焦机构与照明强度控制装置位置合理，单手可操作，符合 SEMI S2/S8 标准，操作舒适、安全性高 。

Product Name: OLYMPUS MX51 Industrial Inspection Microscope.Purpose: It is suitable for research, development, manufacturing and quality management in the fields of industrial materials and electronic components. It is especially suitable for the inspection of semiconductor wafers less than 150mm and magnetic heads, and can also be used for observing a variety of electronic components, wafers and large samples.Performance: It adopts the UIS (infinity-corrected) optical system, which improves the illumination efficiency of the objective lens and illuminator. The defect detection sensitivity in darkfield observation is about 4 times that of the previous generation MX40. It supports a variety of observation methods such as bright field, dark field, phase contrast, differential interference contrast (DIC), simple polarized light and fluorescence. A 158×158mm manual moving stage is standard (which can be used for the inspection of 200mm wafers at most), and a long working distance objective can be selected to facilitate the inspection of magnetic heads. The anti-static design of the fuselage and stage can prevent samples from being damaged by static electricity. The focusing mechanism and the illumination intensity control device are reasonably positioned and can be operated with one hand. It meets the SEMI S2/S8 standards, providing comfortable operation and high safety.