瓦里安 VARIAN XM - 2000用途：是一款极为通用的溅射沉积系统，适用于研发和生产场景。可在半导体、光学等领域，用于在不同材料表面溅射沉积各类金属薄膜。性能：能处理直径 3 英寸至 6 英寸的晶圆，也可适应不规则尺寸的基底。支持使用反应性和非反应性气体，沉积多种金属，如铝、硅、钽、铜等，且批次间重复性与均匀性出色。该系统具备自动过程控制及卓越诊断功能，操作简便、维护轻松，通过独立通风和泵送的负载锁，实现连续且受监控的沉积，还能借助等离子限制屏蔽，物理隔离处理站，避免交叉污染 。

Product Name: VARIAN XM - 2000Purpose: It is an extremely versatile sputtering deposition system, suitable for both R&D and production scenarios. It can be used in the semiconductor, optics, and other fields to sputter and deposit various metal films on the surface of different materials.Performance: It can process wafers with a diameter ranging from 3 inches to 6 inches and can also accommodate substrates of irregular sizes. It supports the deposition of a variety of metals, such as aluminum, silicon, tantalum, copper, etc., using reactive and non - reactive gases, with excellent run - to - run repeatability and uniformity. The system has automatic process control and excellent diagnostic functions, is easy to operate and maintain. Through independently vented and pumped load locks, it can achieve continuous and monitored deposition. In addition, it can physically isolate process stations with plasma confinement shields to avoid cross - contamination.