LEYBOLD Z550MS 溅射系统用途：适用于科研机构及工业生产中，在多种材料基底上进行薄膜沉积，可用于制备锂离子电池电极薄膜、硅薄膜等，在电子、能源、材料科学等领域应用广泛。性能：具备负载锁定系统，操作更便捷高效。配备涡轮分子泵与真空计控制的抽气系统，旋转叶片泵为 D 40 B 。真空计控制精准，IM 110 D 电离真空计可精确监测真空度。溅射时，背景压力可达5×10−5mbar，沉积压力约为6×10−3mbar ，能实现较高质量的薄膜沉积，满足不同工艺需求。

Product Name: LEYBOLD Z550MS sputtering systemPurpose: It is suitable for research institutions and industrial production. It can deposit thin films on a variety of material substrates and is used to prepare thin films for lithium-ion battery electrodes, silicon films, etc. It is widely used in fields such as electronics, energy, and materials science.Performance: Equipped with a load lock system for more convenient and efficient operation. It has a pumping system with a turbomolecular pump and vacuum gauge control, and the rotary vane pump is D 40 B. The vacuum gauge control is accurate, and the IM 110 D ionization vacuum gauge can accurately monitor the vacuum degree. During sputtering, the background pressure can reach 5×10−5 mbar, and the deposition pressure is about 6×10−3 mbar, enabling high-quality thin film deposition to meet different process requirements.