LK TECHNOLOGIES NGI 3000 离子源用途：主要用于样品表面的离子溅射清洁以及其他离子束相关应用，在科研和工业生产中，可对各类样品表面进行预处理，提升后续加工或分析的效果 。性能：离子束能量最高可达 3keV，典型离子电流最高达 30μA。采用创新气体注入系统，能在 1×10⁻⁶托的典型腔室压力下进行溅射，避免了昂贵的差动泵送设备。其离子束截面呈高斯分布，能确保均匀溅射，适用于常规溅射清洁及 ISS 应用。离子束电压可在 200V 至 3kV 之间连续调节，配备带 USB 或以太网接口的数字控制电子设备，方便操作与参数调控 。

Product Name: LK TECHNOLOGIES NGI 3000 Ion SourcePurpose: It is mainly used for ion sputter cleaning of sample surfaces and other ion beam - related applications. In scientific research and industrial production, it can pre - treat the surfaces of various samples to improve the effect of subsequent processing or analysis.Performance: The ion beam energy can reach up to 3 keV, and the typical ion current can reach up to 30 μA. It adopts an innovative gas injection system, which allows sputtering to occur at a typical chamber pressure of 1×10⁻⁶ torr, avoiding expensive differential pumping equipment. Its ion beam cross - section is Gaussian - distributed, ensuring uniform sputtering, and is suitable for general sputter cleaning and ISS applications. The ion beam voltage can be continuously adjusted from 200 V to 3 kV, and it is equipped with digital control electronics with USB or Ethernet interfaces for convenient operation and parameter adjustment.