爱发科 ULVAC Ceraus 系列溅射系统用途：这是一系列用于薄膜沉积的溅射系统，适用于半导体制造、平板显示、光学镀膜等行业。在半导体领域，可进行芯片制造所需的金属电极、绝缘层、阻挡层等薄膜沉积；在平板显示中，用于制备透明导电薄膜等；在光学镀膜方面，能实现各类光学薄膜的制备，提升光学元件性能。性能：以 Ceraus ZX - 1000 为例，采用独特磁控溅射技术，配备 12 英寸靶材，可在 6 英寸和 8 英寸晶圆上作业，能实现优异薄膜质量与均匀性。系统有多个功能腔室，用于不同材料沉积及预清洗等。配备涡轮泵和低温泵，保障高真空环境。部分型号可优化多种工艺配置，实现高定向阻挡金属溅射等，提高生产效率 。

Product Name: ULVAC Ceraus Series Sputtering SystemsPurpose: This is a series of sputtering systems for thin - film deposition, suitable for industries such as semiconductor manufacturing, flat panel display, and optical coating. In the semiconductor field, it can deposit thin films such as metal electrodes, insulating layers, and barrier layers required for chip manufacturing. In flat panel display, it is used to prepare transparent conductive films, etc. In optical coating, it can achieve the preparation of various optical films to improve the performance of optical components.Performance: Taking Ceraus ZX - 1000 as an example, it adopts a unique magnetron sputtering technique, is equipped with a 12 - inch target, and can operate on 6 - inch and 8 - inch wafers, achieving excellent film quality and uniformity. The system has multiple functional chambers for depositing different materials and pre - cleaning, etc. Equipped with turbo pumps and cryo pumps to ensure a high - vacuum environment. Some models can optimize various process configurations to achieve high - directional barrier metal sputtering, etc., improving production efficiency.