瓦里安 VARIAN 3125用途：这是一款高真空溅射系统，适用于科研及半导体等行业的薄膜制备，可在多种基底材料上溅射沉积各类薄膜，用于制造芯片、光学元件等。性能：配备 29 英寸直径 ×24 英寸深的不锈钢水冷卧式腔室，设有 ISO 250 真空端口，虽未自带泵，但能适配不同真空泵。有三个瓦里安 S 枪，搭配一个三重输出电源（型号 980 - 2084 ）。具备旋转行星系统，可使基底均匀受溅射，保证薄膜沉积的均匀性。同时拥有完整的控制机架，可实现精准控制，确保溅射工艺稳定进行。此外，该设备还配有多个瓦里安 S 枪及对应电源，以及 CTI - Cryogenics “on - board 10” 低温泵，能够高效营造高真空环境，满足高质量薄膜溅射需求 。

Product Name: VARIAN 3125Purpose: This is a high - vacuum sputtering system, suitable for thin - film preparation in scientific research and semiconductor industries. It can sputter and deposit various thin films on a variety of substrate materials and is used for manufacturing chips, optical components, etc.Performance: It is equipped with a 29 - inch diameter × 24 - inch deep stainless - steel water - cooled horizontal chamber, with an ISO 250 vacuum port. Although it does not come with a pump, it can be adapted to different vacuum pumps. There are three Varian S - guns, equipped with a triple - output power supply (model 980 - 2084). It has a rotating planetary system, which can make the substrate evenly sputtered and ensure the uniformity of thin - film deposition. At the same time, it has a complete control rack for precise control to ensure the stable progress of the sputtering process. In addition, the equipment is also equipped with multiple Varian S - guns and corresponding power supplies, as well as a CTI - Cryogenics “on - board 10” cryopump, which can efficiently create a high - vacuum environment to meet the needs of high - quality thin - film sputtering.