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爱发科 ULVAC SIH-4545 化学气相沉积(CVD)设备

库存状态:现货

爱发科 ULVAC SIH - 4545用途:这是一款适用于半导体、光学、平板显示等行业的溅射设备。在半导体制造中,用于芯片金属电极、绝缘层等薄膜的溅射沉积;在光学领域,可完成光学镜片增透膜、反射膜等的制备;在平板显示行业,助力透明导电膜等关键薄膜的生产 。性能:虽无公开的详细参数,但基于爱发科技术能力,推测其具备高效真空系统,能快速营造高真空环境,保障薄膜溅射质量。溅射源稳定,可精准调控溅射速率,确保薄膜厚度均匀,偏差极小。具备自动化晶圆传送系统,实现高效连续生产,提升生产效率 。

Product Name: ULVAC SIH - 4545Purpose: This is a sputtering device suitable for industries such as semiconductors, optics, and flat panel displays. In semiconductor manufacturing, it is used for the sputter deposition of thin films such as metal electrodes and insulating layers in chips. In the optical field, it can complete the preparation of anti - reflection coatings and reflective coatings on optical lenses. In the flat panel display industry, it helps in the production of key thin films such as transparent conductive films.Performance: Although there are no publicly available detailed parameters, based on ULVAC's technical capabilities, it is inferred that it has an efficient vacuum system that can quickly create a high - vacuum environment to ensure the quality of thin - film sputtering. The sputtering source is stable and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal deviation. It has an automated wafer transfer system to achieve efficient continuous production and improve production efficiency.

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