爱发科 ULVAC SIH - 3030用途：这是一款真空溅射设备，广泛应用于半导体、光学、平板显示等行业。在半导体领域，用于芯片制造中金属电极、绝缘层等薄膜的溅射沉积；在光学行业，可完成光学镜片增透膜、反射膜等的制备；在平板显示行业，助力透明导电膜等关键薄膜的生产 。性能：虽缺乏公开的具体参数，但基于爱发科技术能力推测，其配备高效真空系统，能快速营造高真空环境，保障薄膜溅射质量。溅射源稳定性佳，可精准调控溅射速率，确保薄膜厚度均匀，偏差极小。设备或许设有自动化晶圆传送系统，能实现高效连续生产，提升生产效率 。

Product Name: ULVAC SIH - 3030Purpose: This is a vacuum sputtering device widely used in industries such as semiconductors, optics, and flat panel displays. In the semiconductor field, it is used for the sputter deposition of thin films such as metal electrodes and insulating layers in chip manufacturing. In the optical industry, it can complete the preparation of anti - reflection coatings, reflective coatings, etc. on optical lenses. In the flat panel display industry, it helps in the production of key thin films such as transparent conductive films.Performance: Although specific public parameters are lacking, based on ULVAC's technical capabilities, it is inferred to be equipped with an efficient vacuum system that can quickly create a high - vacuum environment to ensure the quality of thin - film sputtering. The sputtering source has good stability and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal deviation. The device may be equipped with an automated wafer transfer system to achieve efficient continuous production and improve production efficiency.