GILITEK IBSV - 1030 - V2 离子束溅射真空系统用途：适用于科研及工业生产中的多种薄膜制备场景，能在半导体、光学、材料等领域的各类基底上，如硅片、玻璃、金属片等，沉积金属、氧化物、氮化物等薄膜，满足不同行业对薄膜功能性的需求。性能：该系统具备高真空环境制造能力，可有效提升薄膜沉积质量。虽暂缺详细参数，但推测其离子束能量、束流密度等关键指标能精准调控，从而实现对薄膜沉积速率和厚度的精确控制，确保薄膜具有良好的均匀性与致密性，为复杂工艺提供稳定的薄膜制备方案 。

Product Name: GILITEK IBSV - 1030 - V2 Ion Beam Sputtering Vacuum SystemPurpose: It is suitable for various thin - film preparation scenarios in scientific research and industrial production. It can deposit thin films of metals, oxides, nitrides, etc. on various substrates in the semiconductor, optical, materials, and other fields, such as silicon wafers, glass, and metal sheets, to meet the functional requirements of thin films in different industries.Performance: This system has the ability to create a high - vacuum environment, which can effectively improve the quality of thin - film deposition. Although detailed parameters are lacking, it is speculated that key indicators such as ion beam energy and beam current density can be precisely adjusted, thereby achieving accurate control of the thin - film deposition rate and thickness, ensuring that the thin film has good uniformity and density, and providing a stable thin - film preparation solution for complex processes.