CHA SE 600 高真空电子束蒸发系统用途：适用于科研与工业领域，主要用于在各类基底材料上进行金属、合金及化合物薄膜的沉积。可应用于半导体芯片制造、光学元件镀膜、材料研究等场景，满足高质量薄膜制备需求。性能：通常配备较大尺寸的基底板，能容纳多个用于仪器仪表、控制和旋转运动的馈通装置。搭配较大直径的钟罩和行星夹具，可放置多片晶圆。拥有高性能的扩散泵和前级泵，可实现快速抽气，达到高真空环境。配备电子束蒸发源，能精确控制蒸发速率和薄膜厚度，沉积速率可根据不同材料在一定范围内调节。具备先进的晶体沉积监测仪，实时监控薄膜生长过程，确保薄膜质量的稳定性和一致性 。

Product Name: CHA SE 600 High-Vacuum Electron-Beam Evaporation SystemPurpose: It is suitable for scientific research and industrial fields and is mainly used for depositing thin films of metals, alloys, and compounds on various substrate materials. It can be applied in scenarios such as semiconductor chip manufacturing, optical component coating, and materials research to meet the demand for high-quality thin-film preparation.Performance: It is usually equipped with a relatively large-sized baseplate that can accommodate multiple feedthroughs for instrumentation, control, and rotary motion. It is equipped with a relatively large-diameter bell jar and a planetary fixture, which can hold multiple wafers. It has high-performance diffusion pumps and roughing pumps, enabling rapid pumping to achieve a high-vacuum environment. It is equipped with an electron-beam evaporation source that can accurately control the evaporation rate and film thickness, and the deposition rate can be adjusted within a certain range according to different materials. It has an advanced crystal deposition monitor to real-time monitor the film growth process, ensuring the stability and consistency of film quality.