DENTON VACUUM DV 502A 真空镀膜系统用途：为灵活的高真空蒸发及溅射系统，适用于多种应用场景。可用于金属与碳的旋转遮蔽镀膜，制备金属及电介质薄膜。能在光学镀膜、金属化处理以及电子显微镜样本制备等方面，蒸发多种金属，如碳、金、金 / 钯和铂等。还可实现两种不同金属的连续镀膜，例如在超净干燥的玻璃载玻片或盖玻片上先镀 10 至 12 埃的铬，紧接着镀 50 纳米的金 。性能：具备 4 英寸平面磁控阴极。拥有高真空闸阀，可实现快速循环。有扩散泵或涡轮分子泵可供选择，具备专门的溅射或蒸发能力。集成了厚度监测仪和控制器，可确保精确的镀膜厚度。设有交流辉光用于样品清洁，基底真空度达 10⁻⁶数量级，可处理直径 6 英寸（150 毫米）的基底 。

Product Name: DENTON VACUUM DV 502A Vacuum Coating SystemPurpose: It is a flexible high - vacuum evaporation and sputtering system suitable for a wide range of applications. It can be used for rotary shadowing of metals and carbon and the preparation of metal and dielectric films. It can evaporate various metals such as carbon, gold, gold/palladium, and platinum in optical coating, metallization, and electron microscope sample preparation. It can also achieve successive coating of two different metals. For example, 10 to 12 angstroms of chromium can be coated on super clean and dry glass slides or coverslips first, followed immediately by 50 nanometers of gold.Performance: It has a 4 - inch planar magnetron cathode. It has a high - vacuum gate valve for rapid cycling. There are options of diffusion pumps or turbomolecular pumps and it has dedicated sputtering or evaporation capabilities. It is integrated with thickness monitors and controllers to ensure accurate coating thickness. It is equipped with an AC glow for sample cleaning. The base vacuum degree reaches the order of 10⁻⁶ and it can handle substrates with a diameter of 6 inches (150 mm).