CHA SEC 600 RAP 真空蒸发系统用途：适用于科研与工业领域，主要用于在各类基底材料上进行金属及合金薄膜的沉积，常用于半导体芯片制造、光学元件镀膜、材料研究等场景 。性能：基底板（通常 20 英寸）最多可容纳 15 个用于仪器仪表、控制和旋转运动的馈通装置。常配备 19.5 英寸直径的钟罩和行星夹具，可容纳 18 片 4 英寸晶圆。平均抽气时间少于 30 分钟，每小时产量超过 54 片晶圆。具备 Inficon ic6000 晶体沉积监测仪，拥有自动或手动阀门控制功能，采用扩散泵和前级泵，搭配 19 英寸直径钟罩的电动提升装置，配备 Temescal cv - 8 电子束电源及控制装置、带快门的单腔电子枪 。

Product Name: CHA SEC 600 RAP Vacuum Evaporation SystemPurpose: It is suitable for scientific research and industrial fields, mainly used for depositing metal and alloy thin films on various substrate materials. It is often used in scenarios such as semiconductor chip manufacturing, optical component coating, and materials research.Performance: The baseplate (usually 20 inches) can accommodate up to 15 feedthroughs for instrumentation, control, and rotary motion. It is often equipped with a 19.5 - inch - diameter bell jar and a planetary fixture, which can hold 18 4 - inch wafers. The average pump - down time is less than 30 minutes, allowing a throughput of more than 54 wafers per hour. It has an Inficon ic6000 crystal deposition monitor, with automatic or manual valve control functions. It uses a diffusion pump and a roughing pump, along with a motorized hoist for the 19 - inch - diameter bell jar. It is equipped with a Temescal cv - 8 e - beam power supply and control device, and a single - pocket e - gun with a shutter.