CHA SE 400 RAP 高真空电子束蒸发系统用途：适用于科研机构与工业生产，主要用于在各类基底材料上沉积金属、合金、氧化物及半导体等薄膜。广泛应用于半导体芯片制造、光学元件镀膜、材料研究等领域，以满足高质量薄膜制备需求 。性能：基底板适配多种仪器连接，可容纳多个用于控制与运动的馈通装置。搭配适宜尺寸的钟罩和晶圆夹具，能够放置多片晶圆。拥有高效的真空抽气系统，能快速达到高真空环境。配备精确的电子束蒸发源，可根据不同材料精准调控蒸发速率，有效控制薄膜厚度。具备先进的晶体沉积监测仪，实时监控薄膜生长，保障薄膜质量稳定一致 。

Product Name: CHA SE 400 RAP High-Vacuum Electron-Beam Evaporation SystemPurpose: It is suitable for research institutions and industrial production, mainly used for depositing thin films of metals, alloys, oxides, and semiconductors on various substrate materials. It is widely applied in fields such as semiconductor chip manufacturing, optical component coating, and materials research to meet the demand for high-quality thin-film preparation.Performance: The baseplate is adaptable to various instrument connections and can accommodate multiple feedthroughs for control and motion. It is equipped with a bell jar and wafer fixture of appropriate size, which can hold multiple wafers. It has an efficient vacuum pumping system that can quickly reach a high-vacuum environment. It is equipped with an accurate electron-beam evaporation source that can precisely regulate the evaporation rate according to different materials, effectively controlling the film thickness. It has an advanced crystal deposition monitor to real-time monitor the film growth, ensuring the stability and consistency of film quality.