INNOTEC VS - 24C 高真空批量垂直溅射腔室用途：用于在多种材料基底上进行薄膜溅射沉积，适用于科研机构进行材料研究，以及相关企业在光学薄膜、半导体薄膜等领域的产品生产制备。性能：这是一款高真空系统腔室，虽未找到确切参数，但从其类似设备推测，可能具备高效的真空抽气能力，能快速达到溅射所需的高真空环境。其垂直结构设计，或许有利于提高溅射过程中薄膜沉积的均匀性，可满足不同薄膜制备工艺对腔室环境的要求 。

Product Name: INNOTEC VS - 24C High Vacuum Batch Vertical Sputtering ChamberPurpose: It is used for thin - film sputtering deposition on a variety of material substrates. It is suitable for material research in scientific research institutions and product production and preparation in related enterprises in fields such as optical thin films and semiconductor thin films.Performance: This is a high - vacuum system chamber. Although exact parameters have not been found, inferring from similar equipment, it may have efficient vacuum pumping capabilities and can quickly reach the high - vacuum environment required for sputtering. Its vertical structure design may be beneficial for improving the uniformity of thin - film deposition during the sputtering process and can meet the requirements of different thin - film preparation processes for the chamber environment.