LEYBOLD A550 VZK 溅射系统用途：适用于科研及工业领域，可在多种基底上进行薄膜沉积，常用于制备光学薄膜、半导体薄膜等，应用于光学、电子、材料科学等行业。性能：配备直径约 590mm 的真空腔，搭载涡轮分子泵（型号 TMP 450）与两级旋片泵，极限真空可达5×10−7mbar。支持射频溅射、蚀刻及偏压溅射，具备自动适配的阻抗匹配网络。拥有水冷基板载体，基板与靶材间距可调节，能实现高溅射速率、低基板温度以及出色的膜厚均匀性，还配备有可防止阴极和基板交叉污染的挡板。

Product Name: LEYBOLD A550 VZK sputtering systemPurpose: It is suitable for scientific research and industrial fields. It can deposit thin films on a variety of substrates and is often used to prepare optical films, semiconductor films, etc., applied in industries such as optics, electronics, and materials science.Performance: Equipped with a vacuum chamber with a diameter of about 590mm, a turbomolecular pump (model TMP 450) and a two-stage rotary vane pump are installed, and the ultimate vacuum can reach 5×10−7 mbar. It supports RF sputtering, etching, and bias sputtering, and has an automatically adapted impedance matching network. It has a water-cooled substrate carrier, and the distance between the substrate and the target can be adjusted, enabling high sputtering rates, low substrate temperatures, and excellent film thickness uniformity. It is also equipped with baffles that can prevent cross-contamination between the cathode and the substrate.