爱发科 ULVAC SIH - 350 - T06/C08用途：这是一款在半导体、光学及平板显示等行业应用广泛的溅射设备。在半导体领域，用于芯片制造过程中金属电极、绝缘层等薄膜的溅射沉积；在光学行业，可完成光学镜片增透膜、反射膜等的制备；在平板显示行业，助力透明导电膜等关键薄膜的生产 。性能：虽暂未获取公开的详细参数，但依据爱发科在相关领域的技术能力推断，该设备具备高效的真空系统，能快速营造出满足薄膜溅射需求的高真空环境，为高质量的薄膜沉积提供保障。其溅射源稳定性良好，可精准调控溅射速率，确保薄膜厚度均匀，厚度偏差控制在极小范围。此外，设备可能配备了自动化的晶圆传送系统，以此实现高效的连续生产，提高整体生产效率 。

Product Name: ULVAC SIH - 350 - T06/C08Purpose: This is a sputtering device widely used in industries such as semiconductors, optics, and flat panel displays. In the semiconductor field, it is used for the sputter deposition of thin films such as metal electrodes and insulating layers during chip manufacturing. In the optical industry, it can complete the preparation of anti - reflection coatings, reflective coatings, etc. on optical lenses. In the flat panel display industry, it helps in the production of key thin films such as transparent conductive films.Performance: Although detailed public parameters are not available for the moment, based on ULVAC's technical capabilities in related fields, this device is inferred to have an efficient vacuum system that can quickly create a high - vacuum environment meeting the requirements of thin - film sputtering, providing a guarantee for high - quality thin - film deposition. Its sputtering source has good stability and can precisely control the sputtering rate, ensuring uniform film thickness with a minimal thickness deviation. In addition, the device may be equipped with an automated wafer transfer system to achieve efficient continuous production and improve overall production efficiency.