东京电子 TEL/TOKYO ELECTRON Eclipse Star用途：这是一款溅射设备，用于薄膜材料的研发与生产。在半导体制造中，可为芯片制备金属电极、阻挡层等薄膜；在平板显示领域，能沉积透明导电薄膜；在光学领域，有助于制备光学薄膜以改善元件性能。性能：配备易于操作的触摸屏界面，方便设置与控制溅射流程。采用模块化设计，可根据不同需求和生产要求，配置多种靶材尺寸、穹顶结构及电源，实现最佳工艺控制和生产。具备自动化功能，能同时进行溅射过程，提高生产吞吐量。其喷嘴设计和腔室构造可缩短工艺周期。通过原位测量和控制功能，利用离子束散射（IBS）探测器和均匀性传感器，实现先进的反馈与控制，优化工艺并减少工艺偏差 。

Product Name: TEL/TOKYO ELECTRON Eclipse StarPurpose: This is a sputtering equipment used for the research, development and production of thin - film materials. In semiconductor manufacturing, it can prepare thin films such as metal electrodes and barrier layers for chips. In the flat - panel display field, it can deposit transparent conductive films. In the optical field, it helps prepare optical films to improve component performance.Performance: It is equipped with an easy - to - operate touch - screen interface, which is convenient for setting and controlling the sputtering process. It adopts a modular design and can be configured with a variety of target sizes, dome structures and power supplies according to different needs and production requirements to achieve optimal process control and production. It has an automated function that can perform sputtering processes simultaneously, improving production throughput. Its nozzle design and chamber construction can shorten the process cycle. Through in - situ measurement and control functions, using ion beam scattering (IBS) detectors and uniformity sensors, it realizes advanced feedback and control, optimizes the process and reduces process deviations.