AIRCO TEMESCAL FCE 3200 快速循环蒸发器用途：适用于材料科学研究和工业生产中的薄膜沉积工艺，如在半导体材料、光学元件等表面精准沉积金属或化合物薄膜，助力相关产品制造与新材料研发 。性能：采用高效的真空系统，能够快速建立并维持稳定的高真空环境，保障蒸发过程不受杂质干扰。配备多种规格的蒸发源，可灵活装载不同类型的靶材，满足多样化的薄膜沉积需求。设备具备精准的温度与蒸发速率控制系统，确保薄膜沉积的均匀性和质量稳定性 。

Product Name: AIRCO TEMESCAL FCE 3200 Fast Cycle EvaporatorPurpose: It is suitable for thin - film deposition processes in materials science research and industrial production. For example, it can precisely deposit metal or compound thin films on the surfaces of semiconductor materials and optical components, facilitating the manufacturing of related products and the research and development of new materials.Performance: It adopts an efficient vacuum system that can quickly establish and maintain a stable high - vacuum environment, ensuring that the evaporation process is not interfered with by impurities. It is equipped with a variety of evaporation sources, which can flexibly load different types of targets to meet diverse thin - film deposition requirements. The equipment has a precise temperature and evaporation rate control system to ensure the uniformity and quality stability of thin - film deposition.