ANATECH Hummer VI 溅射镀膜系统用途：这是一款高性能紧凑型溅射镀膜机，适用于科研及工业领域的精密薄膜沉积。常用于材料科学、纳米技术研究，以及电子显微镜样品制备。可在扫描电镜（SEM）或聚焦离子束（FIB）成像前，为样品沉积极薄金膜；也能在绝缘基底上沉积薄膜，有效减少样品表面电荷，适用于电子束光刻 。性能：采用直流溅射法，兼容金（Au）、铂（Pt）、钯（Pd）等多种导电涂层靶材。配备高真空腔室，方便样品装载。电源为可调节直流电源，能优化沉积速率。具备精准的膜厚控制系统，确保薄膜均匀且可重复沉积。每次镀膜周期约 20 分钟，效率较高 。

Product Name: ANATECH Hummer VI Sputtering Coating SystemPurpose: It is a high - performance and compact sputtering coater suitable for precision thin - film deposition in scientific research and industrial fields. It is often used in materials science, nanotechnology research, and electron microscopy sample preparation. It can deposit a very thin gold film on samples before imaging under a scanning electron microscope (SEM) or a focused ion beam (FIB). It can also deposit a thin film on an insulating substrate to effectively reduce the surface charge of the sample, which is suitable for electron beam lithography.Performance: It adopts DC sputtering method and is compatible with a variety of conductive coating target materials such as gold (Au), platinum (Pt), and palladium (Pd). It is equipped with a high - vacuum chamber for easy sample loading. The power supply is an adjustable DC power supply that can optimize the deposition rate. It has a precise film thickness control system to ensure uniform and repeatable thin - film deposition. Each coating cycle takes about 20 minutes, with high efficiency.