巴尔查斯 BALZERS 760 高真空镀膜设备用途：适用于光学、科研及半导体等领域。在光学行业，主要用于在镜片、滤光片等元件上镀制增透、反射、分光等功能性薄膜，满足光学仪器的需求。科研方面，助力超导薄膜、半导体薄膜等材料薄膜的沉积研究。在半导体领域，可用于芯片制造过程中的薄膜沉积 。性能：为计算机控制的高真空镀膜设备，自动化程度高，镀膜重复性好。镀膜室工作直径 800 毫米，基片安装架能作不同行星运动，满足多样镀膜需求。配备 7kW 的 ESQ 110 电子束蒸发器，蒸发前系统压力可降至2×10−3Pa ，随后通过自动阀门引入氧气。有 CTI On - board 400 低温泵及 CTI 9600 压缩机（水冷）、Leybold Ruvac WSU 251 罗茨泵（无机械泵）。具备 10kW 的石英加热装置、Balzers ESQ 212 电子枪及 EVH 215 电源、Balzers QMG 064 分压控制器、Inficon 762 - 500 - G2 石英晶体沉积控制器 。

Product Name: BALZERS 760 High Vacuum Coating EquipmentPurpose: It is suitable for fields such as optics, scientific research, and semiconductors. In the optical industry, it is mainly used to coat functional films such as anti - reflection, reflection, and beam - splitting films on components like lenses and optical filters to meet the requirements of optical instruments. In scientific research, it helps with the deposition research of material thin films such as superconducting films and semiconductor films. In the semiconductor field, it can be used for thin film deposition during chip manufacturing.Performance: It is a computer - controlled high - vacuum coating equipment with high automation and good coating repeatability. The working diameter of the coating chamber is 800 mm, and the substrate mounting frame can perform different planetary motions to meet various coating requirements. It is equipped with a 7kW ESQ 110 electron beam evaporator. Before evaporation, the system pressure can be reduced to 2×10−3Pa, and then oxygen is introduced through an automatic valve. It has a CTI On - board 400 cryopump and a CTI 9600 compressor (water - cooled), a Leybold Ruvac WSU 251 roots pump (without a mechanical pump). It also has a 10kW quartz heating device, a Balzers ESQ 212 electron gun and an EVH 215 power supply, a Balzers QMG 064 partial pressure controller, and an Inficon 762 - 500 - G2 quartz crystal deposition controller.