MRC 903M 溅射系统用途：由 Veeco Instruments 制造，该设备广泛用于薄膜光学元件制造、在玻璃基板上沉积导电材料以及制备发光薄膜，可在多种材料表面均匀涂覆薄膜材料 。性能：配备可编程 PLC 系统与三个阴极位置，有负载锁定功能。安装 CTI 8 低温泵与双级机械泵，负载锁定处可选择安装涡轮泵。采用 Advanced Energy 数字射频电源、数字射频匹配网络及数字直流电源，搭配 MKS 数字质量流量控制器。其改进的磁控枪结构可大面积均匀溅射，通过集成四极磁控枪、大面积平面靶材和先进过程控制软件，能精准控制溅射速率、磁场、电离密度和薄膜均匀性。设备具备自动关机等安全功能，用户可调节离子通量、靶材温度、基板温度和射频频率 。

Product Name: MRC 903M Sputtering SystemPurpose: Manufactured by Veeco Instruments, this equipment is widely used in the fabrication of thin - film optical components, deposition of conductive materials on glass substrates, and preparation of luminescent films. It can uniformly coat thin - film materials on the surface of various materials.Performance: It is equipped with a programmable PLC system and three cathode positions, with load - lock function. It installs a CTI 8 cryopump and a two - stage mechanical pump, and a turbopump can be optionally installed at the load - lock. It adopts Advanced Energy digital RF power supply, digital RF matching network, and digital DC power supply, together with MKS digital mass - flow controllers. Its improved magnetron gun structure can achieve uniform sputtering over a large area. Through the integrated quad magnetron gun, large - area planar target, and advanced process control software, it can precisely control the sputter rate, magnetic field, ionization density, and film uniformity. The equipment has safety functions such as automatic shutdown, and users can adjust the ion flux, target temperature, substrate temperature, and RF frequency.