CPA / KURDEX 9900 - 1 溅射系统用途：适用于半导体、材料研究等领域，可在各类基底上进行薄膜沉积。常用于制备半导体芯片制造过程中的金属互连薄膜、光学器件的功能性薄膜，以及材料表面改性研究中的薄膜涂层 。性能：因缺乏具体参数，参考同类产品推测，该系统可能具备多靶位设计，可实现多种材料的共溅射。拥有先进的真空系统，能够营造高真空环境，保障薄膜沉积的高质量与高纯度。具备精确的工艺控制能力，可精准调控薄膜的厚度、成分及均匀性 。

Product Name: CPA / KURDEX 9900 - 1 Sputtering SystemPurpose: It is suitable for fields such as semiconductors and materials research and can deposit thin films on various substrates. It is often used to prepare metal interconnect thin films in semiconductor chip manufacturing, functional thin films for optical devices, and thin - film coatings in materials surface modification research.Performance: Due to the lack of specific parameters, inferring from similar products, this system may have a multi - target design, enabling co - sputtering of multiple materials. It has an advanced vacuum system that can create a high - vacuum environment to ensure the high quality and high purity of thin - film deposition. It has precise process control capabilities and can accurately regulate the thickness, composition, and uniformity of thin films.