巴尔查斯 BALZERS LLS 801 物理气相沉积溅射系统用途：适用于科研机构以及小批量生产场景。常用于半导体、光学、材料研究等领域，在各类基底上沉积金属、合金、化合物等薄膜，如制备半导体芯片的电极薄膜、光学镜片的功能性薄膜 。性能：拥有线性平面磁控系统，设计精简，靶材寿命长且种类丰富。能够在原子尺度进行不同材料的混合镀膜，在旋转筒式操作中，可镀制如磁性器件所需的各向异性薄膜。可支持 4 英寸、6 英寸晶圆。部分设备配有 Windows NT 操作系统、ENI PRG - 50E 电源、CTI Torr 8F 泵等，有 5 个靶材，靶材材料可选 AlCu、NiFe、Ni、Cr、Cu 等 。

Product Name: BALZERS LLS 801 Physical Vapor Deposition Sputtering SystemPurpose: It is suitable for research institutions and small - batch production scenarios. It is often used in fields such as semiconductors, optics, and materials research to deposit thin films of metals, alloys, compounds, etc. on various substrates, such as preparing electrode thin films for semiconductor chips and functional thin films for optical lenses.Performance: It has a linear planar magnetron system with a concise design, long target life, and a rich variety of targets. It can perform mixed coating of different materials at the atomic scale. In rotary drum operations, it can deposit anisotropic films required for magnetic devices, etc. It can support 4 - inch and 6 - inch wafers. Some devices are equipped with a Windows NT operating system, an ENI PRG - 50E power supply, a CTI Torr 8F pump, etc. It has 5 targets, and the target materials can be selected from AlCu, NiFe, Ni, Cr, Cu, etc.