巴尔查斯 BALZERS ST 801 物理气相沉积（PVD）设备用途：适用于半导体、光学、工具制造及医疗器械等领域。在半导体行业，可用于芯片制造过程中的薄膜沉积；光学领域能为镜片等元件镀制增透、反射等功能薄膜；工具制造中，可提升刀具、模具等的耐磨性与使用寿命；医疗器械方面，能赋予器械良好的生物相容性和抗菌性 。性能：采用先进的 PVD 技术，可沉积多种高性能涂层，如 TiN、TiCN、TiAlN 等氮化物涂层。具备高效的真空抽气系统，能快速营造并维持高真空环境，保障涂层质量。配备多个蒸发源，支持多种材料的共沉积或多层涂层的连续制备，提高生产效率。拥有精准的工艺控制体系，可精确调控涂层的厚度、成分与结构，确保涂层均匀一致 。

Product Name: BALZERS ST 801 Physical Vapor Deposition (PVD) EquipmentPurpose: It is suitable for fields such as semiconductors, optics, tool manufacturing, and medical devices. In the semiconductor industry, it can be used for thin film deposition during chip manufacturing; in the optical field, it can coat lenses and other components with anti-reflective, reflective and other functional thin films; in tool manufacturing, it can improve the wear resistance and service life of cutting tools and molds; in the medical device field, it can endow devices with good biocompatibility and antibacterial properties.Performance: It adopts advanced PVD technology and can deposit a variety of high-performance coatings, such as nitride coatings like TiN, TiCN, and TiAlN. It has an efficient vacuum pumping system that can quickly create and maintain a high-vacuum environment to ensure coating quality. It is equipped with multiple evaporation sources, supporting co-deposition of multiple materials or continuous preparation of multi-layer coatings, improving production efficiency. It has an accurate process control system that can precisely regulate the thickness, composition, and structure of the coating, ensuring uniform and consistent coatings.