巴尔查斯 BALZERS LLS 502 物理气相沉积（PVD）溅射系统用途：适用于科研开发以及小批量生产场景。可在半导体、光学、材料研究等领域的各类基底上，进行金属、合金、化合物等薄膜的沉积，用于制备半导体芯片的电极薄膜、光学镜片的增透或反射薄膜等 。性能：采用紧凑设计，占地空间小。配备计算机控制系统及 LLS 502 软件，操作简便且精准。具备先进的真空系统，如 Leybold LEYVAC LV80C 真空泵，能快速达到高真空环境。搭配 Advanced Energy MDX - 10X 电源、Balzers MSU 200 电源以及 Hutinger PFG 1600 射频发生器，可提供稳定且合适的溅射能量，确保薄膜沉积的高质量与高稳定性 。

Product Name: BALZERS LLS 502 Physical Vapor Deposition (PVD) Sputtering SystemPurpose: It is suitable for scientific research and development as well as small - batch production scenarios. It can deposit thin films of metals, alloys, compounds, etc. on various substrates in fields such as semiconductors, optics, and materials research, and is used to prepare electrode thin films for semiconductor chips, anti - reflection or reflective thin films for optical lenses, etc.Performance: It adopts a compact design with a small footprint. It is equipped with a computer control system and LLS 502 software, which is easy to operate and accurate. It has an advanced vacuum system, such as the Leybold LEYVAC LV80C vacuum pump, which can quickly reach a high - vacuum environment. It is equipped with an Advanced Energy MDX - 10X power supply, a Balzers MSU 200 power supply, and a Hutinger PFG 1600 RF generator, which can provide stable and appropriate sputtering energy to ensure the high quality and high stability of thin - film deposition.