巴尔查斯 BALZERS Z 590 物理气相沉积（PVD）设备用途：适用于工具制造、模具加工、半导体及医疗器械等领域。在工具与模具方面，通过沉积高性能涂层，提升其耐磨性、抗腐蚀性与使用寿命；半导体制造中用于芯片关键薄膜的制备；医疗器械领域则为相关器械提供具备生物相容性、耐磨且抗菌的涂层 。性能：采用先进的多弧离子镀技术，可稳定沉积如 TiN、TiCN、TiAlN 等多种氮化物涂层。具备高效真空系统，能快速达到并维持高真空环境，确保涂层质量。设备配备多个蒸发源，可实现多种材料的共沉积或多层涂层的连续制备，提高生产效率。拥有精准的工艺控制系统，可精确调控涂层的厚度、成分与结构，保障涂层的均匀性与一致性 。

Product Name: BALZERS Z 590 Physical Vapor Deposition (PVD) EquipmentPurpose: It is suitable for fields such as tool manufacturing, mold processing, semiconductors, and medical devices. In the aspect of tools and molds, it improves their wear resistance, corrosion resistance, and service life by depositing high-performance coatings. In semiconductor manufacturing, it is used for the preparation of key thin films for chips. In the medical device field, it provides coatings with biocompatibility, wear resistance, and antibacterial properties for related devices.Performance: It adopts advanced multi-arc ion plating technology and can stably deposit various nitride coatings such as TiN, TiCN, and TiAlN. It has an efficient vacuum system that can quickly reach and maintain a high-vacuum environment to ensure coating quality. The equipment is equipped with multiple evaporation sources, enabling co-deposition of multiple materials or continuous preparation of multi-layer coatings, improving production efficiency. It has an accurate process control system that can precisely control the thickness, composition, and structure of the coating, ensuring the uniformity and consistency of the coating.