ANATECH Hummer 10.2 溅射镀膜机用途：常用于科研及工业领域。在科研方面，可用于材料科学研究中制备金属及合金薄膜，助力研究材料特性；在工业中，能够为电子显微镜样品镀上金、银、钯等金属薄膜，改善样品导电性，满足扫描电镜成像等需求 。性能：采用蚀刻阴极技术沉积材料，搭配一体化双级、直接驱动的 3.8cfm 旋片真空泵。设备为手动控制，镀膜完成后自动排气。能容纳三个尺寸为 75mm x 55mm 的环形靶材，样品台可适配最大直径 200mm 的基底，运行时需通入氩气作为工作气体 。

Product Name: ANATECH Hummer 10.2 Sputtering CoaterPurpose: It is often used in scientific research and industrial fields. In scientific research, it can be used to prepare metal and alloy thin films in materials science research, helping to study material properties. In industry, it can deposit metal films such as gold, silver, and palladium on electron microscopy samples to improve sample conductivity and meet the imaging requirements of scanning electron microscopes.Performance: It uses an etch cathode technique for material deposition and is equipped with an integral dual - stage, direct - drive 3.8 cfm rotary vane vacuum pump. The equipment is manually controlled and automatically vents after the coating process. It can accommodate three annulus targets with a size of 75mm x 55mm, and the sample stage can adapt to substrates with a maximum diameter of 200mm. Argon gas is required as the working gas for operation.