GILITEK IBSV - 1030 离子束溅射真空系统用途：主要用于在多种材料基底上进行高质量薄膜沉积，广泛应用于半导体、光学、材料科学等领域。比如在半导体制造中制备电极薄膜，光学领域制作增透膜、反射膜等，助力提升相关产品性能。性能：该系统能够营造高真空环境，为优质薄膜沉积奠定基础。其离子束能量与束流可精确调控，能实现对薄膜沉积速率及厚度的精准把控，确保薄膜均匀性与致密性良好，满足不同工艺对薄膜质量的严格要求 。

Product Name: GILITEK IBSV - 1030 Ion Beam Sputtering Vacuum SystemPurpose: It is mainly used for high - quality thin - film deposition on a variety of material substrates and is widely applied in fields such as semiconductors, optics, and materials science. For example, it is used to prepare electrode thin films in semiconductor manufacturing and make anti - reflection films and reflective films in the optical field, helping to improve the performance of related products.Performance: This system can create a high - vacuum environment, laying the foundation for high - quality thin - film deposition. Its ion beam energy and beam current can be precisely adjusted, enabling accurate control of the thin - film deposition rate and thickness, ensuring good film uniformity and density, and meeting the strict requirements for film quality in different processes.