GILITEK IBS 离子束溅射系统用途：适用于科研机构及工业生产中各类薄膜制备。在半导体领域，可用于制作芯片的电极、绝缘层等；光学行业里，能制备增透膜、反射膜等提升光学元件性能；材料研究方面，助力开发新型功能材料薄膜。性能：可精准调控离子束能量与束流，实现对薄膜沉积速率、厚度及成分的精确控制。具备高真空环境营造能力，减少杂质混入，保障薄膜高纯度。能在多种基底材料，如硅片、玻璃、金属等表面，沉积出均匀、致密且附着力强的薄膜 。

Product Name: GILITEK IBS Ion Beam Sputtering SystemPurpose: It is suitable for the preparation of various thin films in scientific research institutions and industrial production. In the semiconductor field, it can be used to fabricate electrodes, insulating layers, etc. of chips; in the optical industry, it can prepare anti - reflection films, reflective films, etc. to improve the performance of optical components; in materials research, it helps to develop new functional material thin films.Performance: It can precisely regulate the ion beam energy and beam current, achieving accurate control of the thin - film deposition rate, thickness, and composition. It has the ability to create a high - vacuum environment, reducing the mixing of impurities and ensuring the high purity of the thin film. It can deposit uniform, dense, and strongly adherent thin films on the surfaces of various substrate materials, such as silicon wafers, glass, and metals.