NORDIKO 3000 离子束沉积系统用途：主要用于材料表面的薄膜沉积，在科研领域助力研发新型材料，比如制备用于传感器、自旋阀等的功能薄膜；在工业生产中，可应用于半导体制造，为芯片溅射金属或绝缘薄膜，以满足电路连接、绝缘及信号传输等需求；在光学行业，用于制备增透膜、反射膜等，提升光学元件性能 。性能：运用离子束沉积技术，能精确控制薄膜生长。以某实验数据为例，在进行特定材料沉积时，采用 65W 射频功率，射频栅极电压为 + 500V、 -200V ，通入 8 sccm 的氩气，样品以 40% 的速率旋转，在 70º 或 40º 的角度进行扫描。在 70º 扫描角度、65W 功率下，部分材料的蚀刻速率为：结、自旋阀约 60Å/ 分钟，铝约 160Å/ 分钟，三氧化二铝约 57Å/ 分钟，二氧化硅约 170Å/ 分钟 ，钴锆铌约 130Å/ 分钟，光刻胶约 55Å/ 分钟（光刻胶在 110 ºC 下烘烤 5 分钟） 。

Product Name: NORDIKO 3000 Ion Beam Deposition SystemPurpose: It is mainly used for thin - film deposition on material surfaces. In the scientific research field, it helps develop new materials, such as preparing functional films for sensors, spin valves, etc. In industrial production, it can be applied in semiconductor manufacturing to sputter metal or insulating films for chips to meet the requirements of circuit connection, insulation, and signal transmission. In the optical industry, it is used to prepare anti - reflection films, reflective films, etc., to improve the performance of optical components.Performance: It uses ion beam deposition technology to precisely control film growth. Taking some experimental data as an example, when depositing specific materials, a 65W RF power is used, the RF grid voltage is +500V and -200V, 8 sccm of argon gas is introduced, the sample rotates at a rate of 40%, and scans at an angle of 70º or 40º. At a scanning angle of 70º and a power of 65W, the etching rates of some materials are as follows: junctions and spin valves are about 60Å/min, aluminum is about 160Å/min, aluminum oxide is about 57Å/min, silicon dioxide is about 170Å/min, cobalt zirconium niobium is about 130Å/min, and photoresist is about 55Å/min (the photoresist is baked at 110 ºC for 5 minutes).