LEYBOLD Z550SM 溅射系统用途：该设备主要用于各类材料的薄膜沉积。在光学领域，能够制造具有特定光学性能的薄膜，比如高反射率薄膜用于光学镜片，提升镜片的光学性能；在电子行业，可用于半导体芯片制造，为芯片溅射金属或绝缘薄膜，满足电路连接与绝缘等需求；在科研机构中，有助于研发新型薄膜材料，探索不同材料组合的特性 。性能：配备 4 - 5 个磁控阴极，支持直流（DC）和射频（RF）溅射蚀刻，可实现多种材料的溅射。拥有 5 个位置的磁控溅射源（MAGNETRON PK 150），采用 6 英寸溅射原理，阴极直径有 3 英寸等规格。具备负载锁定功能，能够高效地处理不同尺寸的基板，满足多样化的生产需求。可用于溅射金属及贵金属，实现高质量的薄膜沉积 。

Product Name: LEYBOLD Z550SM Sputtering SystemPurpose: This equipment is mainly used for thin - film deposition of various materials. In the optical field, it can manufacture thin - films with specific optical properties. For example, high - reflectivity films can be used for optical lenses to improve the optical performance of the lenses. In the electronics industry, it can be used in semiconductor chip manufacturing to sputter metal or insulating films for chips to meet the needs of circuit connection and insulation. In research institutions, it helps to develop new thin - film materials and explore the characteristics of different material combinations.Performance: It is equipped with 4 - 5 magnetron cathodes, supporting DC and RF sputter etching, enabling the sputtering of a variety of materials. It has a 5 - position magnetron sputtering source (MAGNETRON PK 150), adopts a 6 - inch sputtering principle, and the cathode diameter has specifications such as 3 inches. It has a load - lock function, which can efficiently process substrates of different sizes to meet diverse production requirements. It can be used to sputter metals and precious metals to achieve high - quality thin - film deposition.