爱发科 ULVAC ULDiS - 200用途：是一款用于溅射工艺的设备，适用于光学薄膜及金属薄膜的溅射。可在 SiO、SiN 等光学薄膜制作场景中发挥作用，同时也能用于金属溅射，在光学元件制造、电子器件生产等领域应用广泛。性能：采用通过型竖直溅射方式，能有效抑制 particle 产生。支持基板往复或 line 式搬送，具备高效的薄膜沉积能力。设备内部搭载皮拉尼真空计等组件，可实现对真空环境的精准监测与调控，保障溅射工艺在稳定的真空条件下进行，从而提升薄膜质量与生产效率 。

Product Name: ULVAC ULDiS - 200Purpose: It is a device used for sputtering processes, suitable for the sputtering of optical thin films and metal thin films. It can be used in the production of optical thin films such as SiO and SiN, and can also be used for metal sputtering, with wide applications in fields such as optical component manufacturing and electronic device production.Performance: It adopts a through - type vertical sputtering method, which can effectively suppress the generation of particles. It supports reciprocating or line - type substrate transfer and has efficient thin - film deposition capabilities. The device is equipped with components such as a Pirani vacuum gauge, which can accurately monitor and control the vacuum environment, ensuring that the sputtering process is carried out under stable vacuum conditions, thereby improving film quality and production efficiency.