CHA Mark 40 高真空沉积系统用途：融合 CHA Industries' Mark 50 系统的优势与多样选项，是真空沉积系统的创新突破。适用于科研和工业领域，能满足小批量处理及多种沉积需求，在半导体金属化、光学镀膜、材料研究等方面广泛应用 。性能：拥有 26 英寸 ×26 英寸的水平水冷圆柱形腔室，便于操作。可搭载各类蒸发源，如配备 CHA SR-10 电子束电源（10 kW）及 CHA T 271-4-1 电子束源，有 4 个 15cc 坩埚位。具备电子束（e - beam）金属薄膜蒸发能力，可从多达 4 个独立源进行蒸发。使用钕磁铁的智能源电子枪，经多次清洁和转塔更换后磁性依旧稳定。独特的联锁坩埚盖可防止蒸发时源材料交叉污染。系统通过 PLC 自动化及触摸屏界面进行监控与控制 。

Product Name: CHA Mark 40 High-Vacuum Deposition SystemPurpose: Combining the advantages of CHA Industries' Mark 50 system with a wide range of options, it is an innovative breakthrough in vacuum deposition systems. It is suitable for scientific research and industrial fields, capable of meeting small-lot processing and various deposition needs, and is widely used in semiconductor metallization, optical coating, materials research, etc.Performance: It has a 26-inch × 26-inch horizontal water-cooled cylindrical chamber for easy operation. It can be equipped with various evaporation sources, such as a CHA SR-10 e-beam power supply (10 kW) and a CHA T 271-4-1 e-beam source, with 4 crucible positions of 15cc each. It has the ability to evaporate electron beam (e - beam) metal thin films from up to 4 independent sources. The smart source electron gun with neodymium magnets remains stable in magnetism after multiple cleanings and turret changes. The unique interlocking crucible cover can prevent cross-contamination of source materials during evaporation. The system is monitored and controlled through PLC automation and a touch screen interface.