CHA SE 1000 RAP 高真空电子束蒸发系统用途：适用于科研与工业场景，能在半导体芯片制造中沉积金属互连薄膜，为光学元件镀制增透、反射等功能薄膜，助力材料研究领域探索新型薄膜材料特性 。性能：基底板尺寸适配多种仪器连接，可安装多个用于控制及运动的馈通装置。搭配大尺寸钟罩与晶圆夹具，能放置大量晶圆。真空抽气系统高效，可快速营造高真空环境。电子束蒸发源精准，能依据不同材料精确调控蒸发速率，进而把控薄膜厚度。配备先进晶体沉积监测仪，实时监测薄膜生长，确保薄膜质量稳定 。

Product Name: CHA SE 1000 RAP High-Vacuum Electron-Beam Evaporation SystemPurpose: It is suitable for scientific research and industrial scenarios. It can deposit metal interconnect thin films in semiconductor chip manufacturing, coat optical components with anti-reflective, reflective and other functional thin films, and assist in exploring the properties of new thin film materials in the field of materials research.Performance: The baseplate is sized to fit a variety of instrument connections and can be installed with multiple feedthroughs for control and motion. It is equipped with a large bell jar and wafer fixture, which can hold a large number of wafers. The vacuum pumping system is efficient and can quickly create a high-vacuum environment. The electron-beam evaporation source is precise and can accurately regulate the evaporation rate according to different materials, thus controlling the film thickness. It is equipped with an advanced crystal deposition monitor to real-time monitor the film growth, ensuring the stability of film quality.