ANATECH Hummer VIII 溅射镀膜机用途：主要用于科研及工业领域的薄膜沉积。在材料科学研究中，可制备金属及合金薄膜用于研究材料特性；在电子显微镜样品制备方面，能够为样品表面镀上金、银、钯等金属薄膜，以改善样品导电性，满足扫描电镜等成像需求 。性能：采用蚀刻阴极技术进行材料沉积，配备一体化双级、直接驱动的 3.8cfm 旋片真空泵。设备手动控制，镀膜结束后自动排气。可容纳三个尺寸为 75mm x 55mm 的环形靶材，样品台直径能适配最大 200mm 直径的基底。运行需通入氩气作为工作气体 。

Product Name: ANATECH Hummer VIII Sputtering CoaterPurpose: It is mainly used for thin - film deposition in scientific research and industrial fields. In materials science research, it can prepare metal and alloy thin films for studying material properties. In electron microscopy sample preparation, it can deposit metal films such as gold, silver, and palladium on the sample surface to improve sample conductivity and meet the imaging requirements of scanning electron microscopes and the like.Performance: It uses an etch cathode technique for material deposition and is equipped with an integral dual - stage, direct - drive 3.8 cfm rotary vane vacuum pump. The equipment is manually controlled and automatically vents after the coating process. It can accommodate three annulus targets with a size of 75mm x 55mm, and the sample stage diameter can adapt to substrates with a maximum diameter of 200mm. Argon gas is required as the working gas for operation.