AMAT/APPLIED MATERIALS NAR 1200L 垂直连线溅射机用途：主要用于半导体制造领域，在晶圆等基底材料表面进行高质量薄膜溅射沉积，能够满足芯片制造过程中金属互连层、阻挡层等关键薄膜的制备需求 。性能：采用垂直连线设计，能高效处理晶圆。循环时间较短，约 40 秒。可处理玻璃尺寸达 730mm x 920mm。具备良好的真空性能，入口 / 出口腔室真空度＜2e-02hPa，传输腔室＜5e-06hPa，工艺腔室＜5e-06hPa。生产效率较高，吞吐量可达 180 片基板 / 小时（每载具 2 片），靶材利用率＞40% 。

Product Name: AMAT/APPLIED MATERIALS NAR 1200L Vertical In - Line Sputtering MachinePurpose: It is mainly used in the semiconductor manufacturing field for high - quality thin - film sputtering deposition on the surface of substrate materials such as wafers. It can meet the requirements for the preparation of key thin films such as metal interconnect layers and barrier layers during chip manufacturing.Performance: It adopts a vertical in - line design, which can efficiently process wafers. It has a short cycle time of about 40 seconds. It can process glass with a size of 730mm x 920mm. It has good vacuum performance. The vacuum degree of the entrance/exit chamber is < 2e - 02hPa, the transfer chamber is < 5e - 06hPa, and the process chamber is < 5e - 06hPa. Its production efficiency is high, with a throughput of up to 180 substrates per hour (2 substrates per carrier), and the target utilization rate is > 40%.